The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2021
Filed:
Dec. 23, 2020
New Visual Media Group, L.l.c., Eatontown, NJ (US);
Elliott Schlam, Wayside, NJ (US);
New Visual Media Group, L.L.C., Eatontown, NJ (US);
Abstract
A shutter system includes a substrate having a front surface with a length and a width, and a conductive layer on a portion of the front surface of the substrate; a dielectric layer disposed on the conductive layer; and an electrostatic shutter having a proximal end attached to the dielectric layer such that a portion of the shutter is in direct physical contact with the dielectric layer at a point at or adjacent the attached proximal end. The shutter is configured to transition between extended and retracted configurations. In the same or an alternative embodiment, the system includes a reinforcement configured such that when the shutter is in the extended configuration, an edge at a distal end of the shutter opposite the proximal end remains substantially parallel to the proximal end of the shutter as the shutter transitions from the extended configuration to the retracted configuration.