The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2021
Filed:
Sep. 26, 2018
Fujifilm Corporation, Tokyo, JP;
Shunya Katoh, Kanagawa, JP;
Rie Takasago, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a method for producing a reflective layer having excellent diffuse reflectivity and a reflective layer having excellent diffuse reflectivity. The method for producing a reflective layer of the present invention includes Step 1 of applying a composition containing a liquid crystal compound and a chiral agent onto a substrate and heating the applied composition to align the liquid crystal compound into a cholesteric liquid crystalline phase state, and Step 2 of forming a reflective layer by cooling or heating the composition so that the helical twisting power of the chiral agent contained in the composition in the cholesteric liquid crystalline phase state increases by 5% or more.