The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2021
Filed:
Apr. 03, 2019
Applicant:
Hitachi Metals, Ltd., Tokyo, JP;
Inventor:
Alexei V. Smirnov, Fort Collins, CO (US);
Assignee:
Hitachi Metals, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01F 1/696 (2006.01); G05D 7/06 (2006.01); G01K 7/14 (2006.01); G01K 7/42 (2006.01); G01F 1/684 (2006.01);
U.S. Cl.
CPC ...
G01F 1/6965 (2013.01); G05D 7/0635 (2013.01); G01F 1/6847 (2013.01); G01K 7/14 (2013.01); G01K 7/42 (2013.01);
Abstract
Mass flow controllers and methods for controlling mass flow controllers are disclosed. A method includes providing a gas through a thermal mass flow sensor of the mass flow controller and processing a flow sensor signal from the thermal mass flow sensor of the mass flow controller to produce a measured flow signal. The measured flow signal is corrected to produce a corrected flow signal by gradually changing non-linearity correction to the measured flow signal when a flow rate of the gas changes. A valve of the mass flow controller is controlled using the corrected flow signal and a setpoint signal.