The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 2021

Filed:

Apr. 02, 2020
Applicant:

Agc Inc., Chiyoda-ku, JP;

Inventors:

Yutaka Furukawa, Chiyoda-ku, JP;

Taiki Hoshino, Chiyoda-ku, JP;

Keigo Matsuura, Chiyoda-ku, JP;

Makoto Uno, Chiyoda-ku, JP;

Eiichiro Anraku, Chiyoda-ku, JP;

Assignee:

AGC Inc., Chiyoda-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 65/00 (2006.01); C07F 7/18 (2006.01); C08G 65/336 (2006.01); C09D 171/00 (2006.01);
U.S. Cl.
CPC ...
C08G 65/007 (2013.01); C07F 7/1804 (2013.01); C08G 65/336 (2013.01); C09D 171/00 (2013.01);
Abstract

To provide a fluorinated ether compound capable of forming a surface layer excellent in fingerprint stain removability and abrasion resistance as before and more excellent in light resistance than ever. A fluorinated ether compound represented by A—O—(RO)—A, wherein Ais a perfluoroalkyl group or the like, Ais —Q[—C(R)(R)]or the like, Ris a fluoroalkylene group, m is from 2 to 500, Qis a a+1 valent organic group, Ris —Q—Si(R)(R)(R), Ris a hydrogen atom, a halogen atom or the like, a is an integer of from 1 to 3, b is 2 or 3, Qis a single bond or a bivalent organic group, Ris —Q—Si(R)(R), Ris an alkyl group, Ris a hydrolyzable group or a hydroxy group, c, d and e are from 0 to 3, c+d+e is 3, c in at last one Ramong a plurality of Ris 2 or 3, Qis a bivalent organic group, Ris an alkyl group, Ris a hydrolyzable group or a hydroxy group, and g is from 1 to 3.


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