The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2021
Filed:
Jul. 28, 2017
Imec Vzw, Leuven, BE;
Katholieke Universiteit Leuven, Ku Leuven R&d, Leuven, BE;
Shengping Mao, Heverlee, BE;
Erik Sohn, Leuven, BE;
Xavier Rottenberg, Kessel-Lo, BE;
Chengxun Liu, Kessel-Lo, BE;
IMEC vzw, Leuven, BE;
Katholieke Universiteit Leuven, KU LEUVEN R&D, Leuven, BE;
Abstract
At least one embodiment relates to a focusing arrangement for focusing particles or cells in a flow. The arrangement includes at least one channel for guiding the flow. The channel includes (i) at least one particle confinement structure having particle flow boundaries and (ii) at least one acoustic confinement structure having acoustic field boundaries adapted for confining acoustic fields. The acoustic field boundaries may be different from the particle flow boundaries, and the at least one acoustic confinement structure may be arranged with regard to the channel to at least partially confine acoustic fields in the channel.