The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 2021

Filed:

Sep. 30, 2020
Applicant:

Uop Llc, Des Plaines, IL (US);

Inventors:

Rebecca Mudrock, Wauconda, IL (US);

Pengfei Chen, Glenview, IL (US);

Zhanping Xu, Inverness, IL (US);

Assignee:

UOP LLC, Des Plaines, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 8/00 (2006.01); B01J 8/02 (2006.01); B01J 8/04 (2006.01);
U.S. Cl.
CPC ...
B01J 8/0492 (2013.01); B01J 8/0278 (2013.01); B01J 8/0453 (2013.01);
Abstract

The hydroprocessing reactor quench zone internals comprise a collection tray, a mixing chamber, a ring quench distributer, a rough liquid distribution tray, and a vapor-liquid distribution tray. The rough liquid distribution tray has a central pan for receiving vapor and liquid out of the mixing chamber and multiple fluid distribution troughs attached to the central pan that extended radially outwards with the outer end close to the reactor shell. The fluid distribution troughs can include at least one longitudinal baffle, or at least one cross baffle, or both, and optionally an end baffle. The baffles improve the liquid and/or vapor flow in the rough liquid distribution tray.


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