The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2021

Filed:

Feb. 01, 2018
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventor:

Daisuke Tsunami, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/417 (2006.01); H01L 21/768 (2006.01); H01L 23/48 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 29/45 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4175 (2013.01); H01L 21/76898 (2013.01); H01L 23/481 (2013.01); H01L 29/0657 (2013.01); H01L 29/401 (2013.01); H01L 29/45 (2013.01);
Abstract

Because of inclusion of: a source electrode that is formed on a front surface of a semiconductor substrate and that is joined to the semiconductor substrate both at a source electrode as a first contact region that is an ohmic contact region and at a source electrode as a second contact region that is a contact region with a non-ohmic contact or the like; a back-surface electrode formed on a back surface of the semiconductor substrate; and a through hole in which an interconnection is provided that connects the source electrode as the second contact region in the source electrode with the back-surface electrode; it is possible not only to improve the corrosion resistance but also to reduce the leakage current, so that a highly-reliable semiconductor device suited for high frequency operation is provided.


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