The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2021

Filed:

Jul. 10, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Baozhen Li, South Burlington, VT (US);

Chih-Chao Yang, Glenmont, NY (US);

Naftali E. Lustig, Croton on Hudson, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76852 (2013.01); H01L 21/311 (2013.01); H01L 21/76829 (2013.01); H01L 21/76807 (2013.01);
Abstract

Interconnect structures having enhanced reliability is provided in which an electrically conductive structure having a line portion and a via portion is formed utilizing a subtractive process. In some embodiments, a non-conductive barrier liner is formed on physically exposed sidewalls of the via portion and physically exposed sidewalls and a topmost surface of the line portion of the electrically conductive structure. An electrically conductive metal cap is formed on a topmost surface of the via portion of the electrically conductive structure. In other embodiments, a conductive barrier spacer is formed on physically exposed sidewalls of the via portion and physically exposed sidewalls of the line portion of the electrically conductive structure. An electrically conductive metal cap is formed on a topmost surface of the via portion of the electrically conductive structure.


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