The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2021

Filed:

Sep. 09, 2019
Applicant:

Illinois Tool Works Inc., Glenview, IL (US);

Inventors:

Bradley Scott Withers, El Dorado Hills, CA (US);

Corey Alan Hughes, Sacramento, CA (US);

Erik Scott Nelson, Granite Bay, CA (US);

Steven Kenneth Christie, Placerville, CA (US);

Brent Allan Best, Rocklin, CA (US);

Assignee:

Illinois Tool Works Inc., Glenview, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 21/677 (2006.01); B24B 29/00 (2006.01); H01L 21/02 (2006.01); B24D 13/14 (2006.01); H01L 21/67 (2006.01); B24B 53/14 (2006.01); B24B 57/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); B24B 29/005 (2013.01); B24D 13/145 (2013.01); H01L 21/0201 (2013.01); H01L 21/67017 (2013.01); H01L 21/67028 (2013.01); H01L 21/67703 (2013.01); H01L 22/26 (2013.01); B24B 53/14 (2013.01); B24B 57/02 (2013.01);
Abstract

A system for monitoring contamination level of effluent of an offline brush conditioning system includes a first set of reservoirs configured to collect first effluents from corresponding portions of a first brush and a second set of reservoirs configured to collect second effluents from corresponding portions of a second brush, and the first and second effluents are from a fluid used to condition the first and second brushes that are configured to clean a surface of a semiconductor wafer. An effluent contamination monitor is configured to monitor contamination levels of the first and second effluents, wherein the monitored contamination levels may provide feedback for use in the brush conditioning.


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