The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2021

Filed:

Jan. 24, 2019
Applicant:

Morphotonics Holding B.v., Veldhoven, NL;

Inventors:

Jan Matthijs Ter Meulen, Eindhoven, NL;

Bram Johannes Titulaer, Veldhoven, NL;

Adrianus Van Erven, Casteren, NL;

Ludovicus Vugts, Moergestel, NL;

Assignee:

Morphotonics Holding B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01);
Abstract

A process and equipment texture substrates. A discrete substrate and a resilient stamp with a patterned outer surface having openings and elevations are coated with a formable imprint lacquer and the stamp is bent around an axis of an imaginary cylinder parallel to the plane of the substrate and perpendicular to the imprint direction to obtain a bent resilient stamp having a particular imprint-curvature. The bent stamp contacts formable imprint lacquer to apply imprint pressure onto a substrate contact area. The imprint pressure is generated by a resilience force of the stamp. The substrate and/or stamp move relative to one another while pressing the outer surface openings/elevations with the imprint pressure into the lacquer to attain an imprint texture while maintaining constant imprint-curvature. The formable imprint lacquer with the imprint texture solidifies on the substrate, and the stamp is separated from the textured substrate.


Find Patent Forward Citations

Ter Meulen, Jan. (2021). Process and equipment for texturing discrete substrates (U.S. Patent No. 11204550). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11204550

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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