The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2021
Filed:
Apr. 25, 2019
Beijing Boe Optoelectronics Technology Co., Ltd., Beijing, CN;
Boe Technology Group Co., Ltd., Beijing, CN;
Zhiheng Liu, Beijing, CN;
Hao Dong, Beijing, CN;
BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Abstract
A masking process and a mask set. The masking process includes: aligning a first mask with a stage carrying a substrate to be patterned; forming a first layer structure and a first overlay correction pattern on the substrate to be patterned by using the first mask; correcting with an image sensor and the first overlay correction pattern; aligning a second mask with the stage; forming a second layer structure and a second overlay correction pattern on the substrate to be patterned by using the second mask; and correcting with the image sensor and the second overlay correction pattern.