The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 21, 2021

Filed:

Nov. 19, 2019
Applicant:

Facebook Technologies, Llc, Menlo Park, CA (US);

Inventors:

Sean Jason Keller, Bellevue, WA (US);

David R. Perek, Seattle, WA (US);

Tristan Thomas Trutna, Seattle, WA (US);

Garrett Andrew Ochs, Seattle, WA (US);

Nicholas Roy Corson, Woodinville, WA (US);

Raymond King, Woodinville, WA (US);

Jack Lindsay, Seattle, WA (US);

Riccardo DeSalvo, Pasadena, CA (US);

Joseph Minh Tien, Alhambra, CA (US);

Matthew Robert Schwab, Pasadena, CA (US);

Assignee:

Facebook Technologies, LLC, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 7/07 (2006.01); F16K 31/126 (2006.01); F16K 99/00 (2006.01); F15C 3/04 (2006.01); G05D 7/03 (2006.01);
U.S. Cl.
CPC ...
F16K 7/075 (2013.01); F16K 31/126 (2013.01); F15C 3/04 (2013.01); F16K 99/0015 (2013.01); F16K 99/0061 (2013.01); G05D 7/03 (2013.01);
Abstract

A fluidic device comprises a channel, a gate, and one or more additional elements. The channel is configured to transport a fluid from a source to a drain. The gate includes a chamber with an adjustable volume that affects fluid flow within the channel by displacing a wall of the channel toward an opposite wall of the channel based in part on fluid pressure within the chamber exceeding a threshold pressure. A high pressure state of the gate corresponds to a first chamber size and a first flow rate of the fluid. A low pressure state of the gate corresponds to a second chamber size that is smaller than the first chamber size and a second flow rate that is greater than the first flow rate. The additional elements are configured to reduce the threshold pressure past which the chamber decreases the cross-sectional area of the channel.


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