The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2021
Filed:
Nov. 20, 2018
Chinese Research Academy of Environmental Sciences, Beijing, CN;
Yonghai Jiang, Beijing, CN;
Yu Yang, Beijing, CN;
Beidou Xi, Beijing, CN;
Xinying Lian, Beijing, CN;
Huan Huan, Beijing, CN;
Fu Xia, Beijing, CN;
Yongfeng Jia, Beijing, CN;
Xu Han, Beijing, CN;
CHINESE RESEARCH ACADEMY OF ENVIRONMENTAL SCIENCES, Beijing, CN;
Abstract
A remediation system based on pollution obstruction for underground water with DNAPL pollutant is provided, including a vertical obstructing wall, a pump-out treating unit and a recharging unit, wherein the vertical obstructing wall is distributed at the periphery of a polluted area to obstruct the polluted underground water in the vertical obstructing wall; the pump-out treating unit includes a plurality of water pumping wells and overground treatment facility that are distributed in the polluted area, the plurality of the water pumping wells are configured to pump the polluted underground water out and sending it into the overground treatment facility so as to be treated; the recharging unit includes a plurality of recharging wells, and water treated by the overground treatment facility is recharged into a target aquifer in the polluted area by the plurality of the recharging wells. A remediation method using the system is provided.