The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2021
Filed:
Dec. 02, 2020
Bae Systems Information and Electronic Systems Integration Inc., Nashua, NH (US);
Yannick Morel, Falls Church, VA (US);
Peter Budni, Nashua, NH (US);
Peter Ketteridge, Amherst, NH (US);
Michael Lemons, Antrim, NH (US);
Kevin T Werner, Nashua, NH (US);
BAE Systems Information and Electronic Systems Integration Inc., Nashua, NH (US);
Abstract
The system and method of producing a first path comprising a pulse stretcher for a mid-wave infrared (MWIR) signal, an optical parametric chirped-pulse amplification (OPCPA) amplifier, and a MWIR compressor for producing a first beam in a MWIR portion of the spectrum and a second path comprising a pulse stretcher for a long wave infrared (LWIR) signal, an OPCPA amplifier, and a LWIR compressor for producing a second beam in a LWIR portion of the spectrum. Each beam, on its own, is configured to produce laser-matter interactions at long range (100s of meters), having nonlinear effects and favoring supercontinuum generation spanning multiple octaves, that is temporally and spatially overlapped with the fundamental laser beam.