The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2021
Filed:
Aug. 27, 2019
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Aritra Dasgupta, Wappingers Falls, NY (US);
Oleg Gluschenkov, Tannersville, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 21/268 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28176 (2013.01); H01L 21/268 (2013.01); H01L 29/513 (2013.01); H01L 29/517 (2013.01);
Abstract
Semiconductor structures and methods of fabricating the same using multiple nanosecond pulsed laser anneals are provided. The method includes exposing a gate stack formed on a semiconducting material to multiple nanosecond laser pulses at a peak temperature below a melting point of the semiconducting material.