The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2021

Filed:

Feb. 28, 2020
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Toshihiro Maeda, Utsunomiya, JP;

Osamu Yasunobe, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 33/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/424 (2013.01); B29C 2033/426 (2013.01);
Abstract

An imprint apparatus configured to form a pattern of an imprint material on a substrate using a mold includes a holding unit configured to hold the mold with a holding surface making contact with a first surface of the mold, a deformation unit configured to apply a force to the mold held at the holding surface to deform the mold, and a drive unit configured to move at least one of the mold held by the holding unit and the deformation unit to change a relative position between the mold held by the holding unit and the deformation unit. The drive unit changes a position where the deformation unit applies a force to the mold in a direction vertical to the first surface based on information about a position of a second surface on an opposite side of the first surface.


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