The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2021
Filed:
Jan. 29, 2019
Canon Kabushiki Kaisha, Tokyo, JP;
Kiyohito Yamamoto, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An imprint apparatus includes a processing unit that forms a pattern of an imprint material on a substrate by using a mold, a chamber that accommodates this processing unit and includes a first gate to which a first containment unit that contains the substrate before being processed by the processing unit is connected and a second gate to which a second containment unit that contains the substrate after being processed by the processing unit is connected, and a control unit that prohibits opening of the first gate until a predetermined time elapses since the substrate on which the pattern is formed by the processing unit is contained in the second containment unit and the second gate is closed.