The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2021

Filed:

Aug. 09, 2018
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Seth J. Bamesberger, Austin, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 43/02 (2006.01); B29C 43/00 (2006.01); B29C 43/56 (2006.01); G03F 7/00 (2006.01); B29C 43/14 (2006.01); G03F 7/20 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B29C 43/021 (2013.01); B29C 43/003 (2013.01); B29C 43/56 (2013.01); G03F 7/0002 (2013.01); G03F 7/703 (2013.01); B29C 2043/025 (2013.01); B29C 2043/142 (2013.01); B29C 2043/566 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

An apparatus may include a substrate holder configured to hold a substrate. The substrate holder may include a first chucking region having a first area and an adjacent region extending from the chucking region. The apparatus may also include a superstrate holder configured to hold a superstrate. The superstrate holder may include a second chucking region having a second area. The second area may be larger than the first area and the superstrate holder faces the substrate holder forming a first gap between the adjacent region surface and the superstrate and a second gap between the substrate and the superstrate. The apparatus may also include a gas supply system between the first gap and the second gap. The superstrate holder may alter a shape of the held superstrate to decrease the first gap and increase the second gap.


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