The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2021

Filed:

Mar. 21, 2018
Applicant:

Lawrence Livermore National Security, Llc, Livermore, CA (US);

Inventors:

Selim Elhadj, Livermore, CA (US);

Jae Hyuck Yoo, Dublin, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/342 (2014.01); G02F 1/135 (2006.01); G02F 1/1333 (2006.01); G02B 27/28 (2006.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B23K 26/06 (2014.01); B23K 26/064 (2014.01); B23K 26/08 (2014.01); B23K 26/03 (2006.01); B23K 26/067 (2006.01); B23K 26/70 (2014.01);
U.S. Cl.
CPC ...
B23K 26/342 (2015.10); B23K 26/032 (2013.01); B23K 26/064 (2015.10); B23K 26/0608 (2013.01); B23K 26/0626 (2013.01); B23K 26/0676 (2013.01); B23K 26/0869 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); G02B 27/283 (2013.01); G02F 1/135 (2013.01); G02F 1/133362 (2013.01); B23K 26/702 (2015.10);
Abstract

The present disclosure relates to a method of modifying a surface of a material, in situ, while the material is being used to at least one of form or modify a portion of a part to remove flaws layer-by-layer and improve a part from a layerwise built, or a coating. The method may involve generating first, second and third beams. The third beam may act on a surface of a material to heat a portion of the surface of the material into a flowable state to thus modify a surface characteristic of the material. The first beam may control an optically addressable light valve (OALV) which modifies an energy of the third beam. The second beam may control an optically addressable electric field modulator (OAEFM) to generate an electric field in a vicinity of the surface and to influence a movement of the portion of material while the portion of material is in the flowable state. The beams are modulated based on a sensing element feedback loop.


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