The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2021

Filed:

Jul. 06, 2016
Applicant:

Ap&c Advanced Powders & Coatings Inc., Boisbriand, CA;

Inventors:

Frédéric Larouche, Île Bizard, CA;

Matthieu Balmayer, Montréal, CA;

Francis Trudeau-Lalonde, Montréal, CA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F 9/08 (2006.01); B22F 9/14 (2006.01); B22F 9/12 (2006.01); B22F 1/00 (2006.01); C22C 1/04 (2006.01);
U.S. Cl.
CPC ...
B22F 9/082 (2013.01); B22F 1/0014 (2013.01); B22F 9/08 (2013.01); B22F 9/12 (2013.01); B22F 9/14 (2013.01); C22C 1/0416 (2013.01); C22C 1/0458 (2013.01); B22F 2009/0836 (2013.01); B22F 2009/0892 (2013.01); B22F 2202/13 (2013.01); B22F 2304/10 (2013.01); B22F 2998/00 (2013.01);
Abstract

A plasma atomization metal powder manufacturing process includes providing a heated metal source and contacting the heated metal source with the plasma of at least one plasma source under conditions effective for causing atomization of the heated metal source. The atomization may be carried out using a gas to metal ratio of less than about 20, thereby obtaining a raw metal powder having a 0-106 μm particle size distribution yield of at least 80%. The process may further include aligning the heated metal source with the plasma of at least one plasma source. An atomizing system may include an alignment system positioned upstream of the plasma source and adapted to adjust an orientation of the metal source relative to the at least one plasma source.


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