The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2021
Filed:
Mar. 29, 2019
Fujifilm Electronic Materials U.s.a., Inc., North Kingstown, RI (US);
Bryan Hinzie, Gilbert, AZ (US);
Marcia Cole-Yocom, Scottsdale, AZ (US);
Michael Barker, Goodyear, AZ (US);
Perry Westberg, Goodyear, AZ (US);
Yuan Chen, Chandler, AZ (US);
Jack Helzer, Chandler, AZ (US);
FUJIFILM Electronic Materials U.S.A., Inc., North Kingstown, RI (US);
Abstract
A chemical liquid manufacturing apparatus, including a first system and a second system, is provided. The first system includes at least one first filtration medium, selected from a first filter, a first ion exchange membrane and a first ion adsorption membrane, wherein the first system is configured to process a material of at least one time. The second system includes at least one second filtration medium, selected from a second filter, a second ion exchange membrane and a second ion adsorption membrane, wherein the second system is configured for recirculation and to process the material of at least two times.