The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Feb. 06, 2018
Applicant:
Nec Laboratories America, Inc., Princeton, NJ (US);
Inventors:
Hui Zhang, Princeton Junction, NJ (US);
Jianwu Xu, Lawrenceville, NJ (US);
Biplob Debnath, Princeton, NJ (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04L 29/06 (2006.01); G06N 20/00 (2019.01); G06N 5/04 (2006.01);
U.S. Cl.
CPC ...
H04L 63/1425 (2013.01); G06N 5/047 (2013.01); G06N 20/00 (2019.01); H04L 63/02 (2013.01); H04L 63/0236 (2013.01); H04L 63/0245 (2013.01); H04L 63/1416 (2013.01); H04L 63/0209 (2013.01); H04L 63/0272 (2013.01); H04L 63/0281 (2013.01); H04L 63/1458 (2013.01);
Abstract
Systems and methods for enabling automated log analysis with controllable resource requirements are provided. A training set for log pattern learning is generated based on heterogeneous logs generated by a computer system. An incremental learning process is implemented to generate a set of log patterns from the training set. The heterogeneous logs are parsed using the set of log patterns. A set of applications is applied to the parsed logs.