The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Oct. 04, 2017
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Hiroshi Kawasaki, Tokyo, JP;
Katsunari Obata, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
In a method for producing a vapor deposition mask including a resin maskincluding resin mask openingscorresponding to a pattern to be produced by vapor deposition, and a metal maskincluding a metal mask opening, the metal mask being stacked on one surface of the resin mask, when the plurality of resin mask openingsare formed, as to any one resin mask openingof the plurality of resin mask openings, the resin mask openingis formed such that in a thicknesswise cross section of the resin mask, an acute angle (θ) formed by one inner wall surface forming the one resin mask opening and the other surface of the resin mask is different from an acute angle (θ) formed by the other inner wall surface forming the one resin mask opening and the other surface of the resin mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile