The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2021

Filed:

Jun. 04, 2020
Applicant:

Fast Sic Semiconductor Incorporated, Hsinchu, TW;

Inventor:

Cheng-Tyng Yen, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/16 (2006.01); H01L 29/872 (2006.01); H01L 29/47 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1608 (2013.01); H01L 29/47 (2013.01); H01L 29/872 (2013.01);
Abstract

A silicon carbide semiconductor device includes a drift layer having a first conductivity type and a surface in which an active region is defined; a plurality of first doped regions having a second conductivity and arranged within the active region; a plurality of second doped regions having a second conductivity and arranged within the active region; and a metal layer disposed on the surface of the drift layer and forming a Schottky contact with the drift layer. Each of the first doped regions has a first minimum width and a first area and are spaced from each other by a first minimum spacing Each of the second doped regions has a second minimum width greater than the first minimum width and a second area greater than the first area and are spaced from the first doped region by a second minimum spacing less than the first minimum spacing.


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