The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2021

Filed:

Sep. 12, 2018
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Dmitri Alex Tschumakow, Dresden, DE;

Claus Dahl, Dresden, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8249 (2006.01); H01L 21/033 (2006.01); H01L 21/3213 (2006.01); H01L 21/8238 (2006.01); H01L 27/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/8249 (2013.01); H01L 21/0337 (2013.01); H01L 21/32139 (2013.01); H01L 21/823864 (2013.01); H01L 27/0623 (2013.01);
Abstract

A method for manufacturing a combined semiconductor device. The method includes providing a semiconductor substrate, providing a protective layer or a protective layer stack in a non-CMOS area of the semiconductor substrate, wherein the non-CMOS area is portion of the semiconductor substrate reserved for a non-CMOS device, at least partially manufacturing a CMOS device in a CMOS area of the semiconductor substrate, the non-CMOS area and the CMOS area being different from each other, removing the protective layer or the protective layer stack, to expose the semiconductor substrate in the non-CMOS area, and manufacturing a non-CMOS device in the non-CMOS area of the semiconductor substrate.


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