The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2021

Filed:

Mar. 20, 2020
Applicant:

Brooks Automation, Inc., Chelmsford, MA (US);

Inventors:

Robert T. Caveney, Windham, NH (US);

Jayaraman Krishnasamy, Billerica, MA (US);

Ulysses Gilchrist, Reading, MA (US);

Mitchell Drew, Rye, NH (US);

Jairo Moura, Marlborough, MA (US);

Assignee:

Brooks Automation, Inc., Chelmsford, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); B25J 9/04 (2006.01); B25J 11/00 (2006.01); B25J 18/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67706 (2013.01); B25J 9/042 (2013.01); B25J 9/043 (2013.01); B25J 11/0095 (2013.01); B25J 18/04 (2013.01); H01L 21/67742 (2013.01); Y10S 901/15 (2013.01); Y10S 901/27 (2013.01); Y10T 74/20305 (2015.01); Y10T 74/20329 (2015.01);
Abstract

A substrate processing apparatus including a frame, a first SCARA arm connected to the frame, including an end effector, configured to extend and retract along a first radial axis; a second SCARA arm connected to the frame, including an end effector, configured to extend and retract along a second radial axis, the SCARA arms having a common shoulder axis of rotation; and a drive section coupled to the SCARA arms is configured to independently extend each SCARA arm along a respective radial axis and rotate each SCARA arm about the common shoulder axis of rotation where the first radial axis is angled relative to the second radial axis and the end effector of a respective arm is aligned with a respective radial axis, wherein each end effector is configured to hold at least one substrate and the end effectors are located on a common transfer plane.


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