The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2021

Filed:

Sep. 21, 2018
Applicant:

Advanced Micro Devices, Inc., Santa Clara, CA (US);

Inventors:

Ruijin Wu, La Jolla, CA (US);

Young In Yeo, La Jolla, CA (US);

Sagar S. Bhandare, La Jolla, CA (US);

Vineet Goel, La Jolla, CA (US);

Martin G. Sarov, La Jolla, CA (US);

Christopher J. Brennan, Boxborough, MA (US);

Assignee:

Advanced Micro Devices, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/80 (2011.01); G06T 1/20 (2006.01); G06T 15/00 (2011.01);
U.S. Cl.
CPC ...
G06T 15/80 (2013.01); G06T 1/20 (2013.01); G06T 15/005 (2013.01);
Abstract

Described herein are techniques for improving the effectiveness of depth culling. In a first technique, a binner is used to sort primitives into depth bins. Each depth bin covers a range of depths. The binner transmits the depth bins to the screen space pipeline for processing in near-to-far order. Processing the near bins first results in the depth buffer being updated, allowing fragments for the primitives in the farther bins to be culled more aggressively than if the depth binning did not occur. In a second technique, a buffer is used to initiate two-pass processing through the screen space pipeline. In the first pass, primitives are sent down to update the depth block and are then culled. The fragments are processed normally in the second pass, with the benefit of the updated depth values.


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