The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Dec. 03, 2020
Boston Polarimetrics, Inc., Palo Alto, CA (US);
Agastya Kalra, Nepean, CA;
Achuta Kadambi, Los Altos Hills, CA (US);
Kartik Venkataraman, San Jose, CA (US);
BOSTON POLARIMETRICS, INC., Palo Alto, CA (US);
Abstract
A method for characterizing a pose estimation system includes: receiving, from a pose estimation system, first poses of an arrangement of objects in a first scene; receiving, from the pose estimation system, second poses of the arrangement of objects in a second scene, the second scene being a rigid transformation of the arrangement of objects of the first scene with respect to the pose estimation system; computing a coarse scene transformation between the first scene and the second scene; matching corresponding poses between the first poses and the second poses; computing a refined scene transformation between the first scene and the second scene based on coarse scene transformation, the first poses, and the second poses; transforming the first poses based on the refined scene transformation to compute transformed first poses; and computing an average rotation error and an average translation error of the pose estimation system based on differences between the transformed first poses and the second poses.