The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Apr. 08, 2020
Powerchip Semiconductor Manufacturing Corporation, Hsinchu, TW;
Jia-Horng Tsai, Taipei, TW;
Powerchip Semiconductor Manufacturing Corporation, Hsinchu, TW;
Abstract
The present disclosure provides a method of manufacturing a phase-shifting photomask, which includes following steps. A mask pattern provides on a transparent substrate and includes a first layer photomask pattern including a phase-shifting layer and a light shielding layer sequentially stacked on the transparent substrate and a second layer photomask pattern stacked on the transparent substrate in sequence. A thermal oxidation process is performed on the second layer photomask pattern to form a thermal oxide layer and a hard-shielding layer pattern exposed a portion of a top surface of the light shielding layer, and the thermal oxide layer covers the hard-shielding layer pattern and the portion of the top surface of the light shielding layer. The thermal oxide layer is removed. A portion of the light shielding layer is removed by using the hard-shielding layer pattern as a mask to form a patterned light shielding layer exposed the phase-shifting layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile