The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Feb. 24, 2016
Ebara Jitsugyo Co., Ltd., Tokyo, JP;
Keio University, Tokyo, JP;
Shuichi Takahashi, Kawasaki, JP;
Michio Ohira, Kawasaki, JP;
Hideo Nakata, Kawasaki, JP;
Shogo Miyata, Yokohama, JP;
Shugo Tohyama, Tokyo, JP;
Jun Fujita, Tokyo, JP;
Keiichi Fukuda, Tokyo, JP;
Ebara Jitsugyo Co., Ltd., Tokyo, JP;
Keio University, Tokyo, JP;
Abstract
The invention provides a method for producing a substrate for supporting cells, including a humidification step of humidifying the periphery of a non-fluorine resin based substrate, and a UV irradiation step of irradiating the substrate with UV in an oxygen and/or ozone containing atmosphere during and/or after the humidification step. The invention also provides a substrate for supporting cells, which is a non-fluorine resin based substrate. The substrate has a cell supporting surface for supporting cells, containing a component capable of generating CHOmolecules by beam irradiation of a time-of-flight secondary ion mass spectrometer, such that cells are supported on the cell-supporting surface.