The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Jul. 07, 2017
Covestro Deutschland Ag, Leverkusen, DE;
Dirk Achten, Leverkusen, DE;
Thomas Büsgen, Leverkusen, DE;
Dirk Dijkstra, Odenthal, DE;
Roland Wagner, Leverkusen, DE;
Covestro Deutschland AG, Leverkusen, DE;
Abstract
A process is described for producing a three dimensional structure, the process including the following steps a) applying of at least a first material Monto a substrate to build a first layer Lon the substrate; b) layering of at least one further layer Lof the first material Mor of a further material Monto the first layer L, wherein the at least one further layer Lcovers the first layer Land/or previous layer Lat least partially to build a precursor of the three dimensional structure; c) curing the precursor to achieve the three dimensional structure; wherein at least one of the materials Mor Mprovides a Mooney viscosity of >10 ME at 60° C. and of <200 ME at 100° C. before curing. Also, a three dimensional structure is described which is available according to the process according to the invention.