The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2021
Filed:
Aug. 28, 2020
Applicants:
Lg Chem, Ltd., Seoul, KR;
Seoul National University R&db Foundation, Seoul, KR;
Inventors:
Mi Jin Lee, Daejeon, KR;
Byeong-Hyeok Sohn, Daejeon, KR;
Seung Yong Chae, Daejeon, KR;
Won Jong Kwon, Daejeon, KR;
Kwon Nam Sohn, Daejeon, KR;
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/00 (2006.01); C01B 32/19 (2017.01); C08F 283/06 (2006.01); C08F 293/00 (2006.01);
U.S. Cl.
CPC ...
B01J 19/0093 (2013.01); C01B 32/19 (2017.08); C08F 283/06 (2013.01); C08F 293/005 (2013.01); B01J 2219/0086 (2013.01); B01J 2219/00891 (2013.01); C08F 2438/03 (2013.01);
Abstract
The present invention relates to a method for preparing graphene using a novel block copolymer. The present invention has features that, by using the block copolymer to mediate graphene that is hydrophobic and a solvent of a feed solution that is hydrophilic, the exfoliation efficiency of graphene as well as the dispersion stability thereof can be increased during high-pressure homogenization.