The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2021

Filed:

Feb. 19, 2021
Applicants:

Rnd-isan, Ltd, Moscow, RU;

Isteq B.v., Eindhoven, NL;

Assignees:

RnD-ISAN, Ltd, Moscow, RU;

ISTEQ B.V., Eindhoven, NL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H05H 1/24 (2013.01);
Abstract

The light source contains a chamber with a region of radiating plasma sustained by a focused beam of a CW laser. The chamber consists of a tube, a bottom and a cap. The cap is arranged for filling the chamber with gas. The tube and bottom are made from an optically transparent material. The bottom is arranged for input into the chamber of the CW laser beam and pulsed laser beams used for the plasma ignition, while the tube is arranged for exit of the output beam of plasma radiation. Preferably shape of the tube is arranged for reducing aberrations which distort a path of rays of plasma radiation passing through the tube wall. The technical result consists in creating electrodeless high-brightness broadband light sources with the high spatial and power stability, and in providing an ability to collect plasma radiation in a spatial angle of more than 9 sr.


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