The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2021

Filed:

Sep. 12, 2017
Applicant:

Nuctech Company Limited, Beijing, CN;

Inventors:

Lan Zhang, Beijing, CN;

Haifan Hu, Beijing, CN;

Xuepeng Cao, Beijing, CN;

Jun Li, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0352 (2006.01); H01L 27/146 (2006.01); H01L 31/02 (2006.01); H01L 31/18 (2006.01); H01L 31/028 (2006.01); H01L 31/0224 (2006.01);
U.S. Cl.
CPC ...
H01L 31/035272 (2013.01); H01L 27/14643 (2013.01); H01L 27/14659 (2013.01); H01L 31/02005 (2013.01); H01L 31/028 (2013.01); H01L 31/022408 (2013.01); H01L 31/18 (2013.01); H01L 31/1804 (2013.01); H01L 2924/12043 (2013.01);
Abstract

According to an embodiment, a method of fabricating a photodiode device may include: growing an epitaxial layer on a first surface of a substrate, wherein the epitaxial layer is first type lightly doped; forming, in the substrate, a first type heavily doped region in contact with the first type lightly doped epitaxial layer; thinning the substrate from a second surface of the substrate opposite to the first surface to expose the first type heavily doped region; patterning the first type heavily doped region from the second surface side of the substrate to form a trench therein, that penetrates through the first type heavily doped region and extends into the epitaxial layer, to serve as a first electrode region of the photodiode device; and forming a second type heavily doped region at bottom of the trench, to serve as a second electrode region of the photodiode device.


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