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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11189457 B1

PDFFull Text
Date of Patent:
Nov. 30, 2021

Filed:

Sep. 29, 2017

Scanning electron microscope

Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Hideo Morishita, Tokyo, JP;

Toshihide Agemura, Tokyo, JP;

Assignee:

HITACHI HIGH-TECH CORPORATION, Tokyo, JP;

Attorney:

Miles & Stockbridge, P.C.

Primary Examiner:

David A Vanore

Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/05 (2006.01); H01J 37/147 (2006.01); H01J 37/14 (2006.01); H01J 37/244 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/05 (2013.01); H01J 37/14 (2013.01); H01J 37/1471 (2013.01); H01J 37/244 (2013.01); H01J 37/32541 (2013.01); H01J 2237/057 (2013.01); H01J 2237/24485 (2013.01); H01J 2237/24564 (2013.01);
Abstract

Provided is a scanning electron microscope provided with an energy selection and detection function for a SEgenerated on a sample while suppressing the detection amount of a SEexcited due to a BSE in the scanning electron microscope that does not apply a deceleration method. Provided are: an electron optical system that includes an electron sourcegenerating an irradiation electron beam and an objective lensfocusing the irradiation electron beam on a sample; a detectorthat is arranged outside an optical axis of the electron optical system and detects a signal electron generated when the sample is irradiated with the irradiation electron beam; a deflection electrode that forms a deflection fieldto guide the signal electron to the detector; a disk-shaped electrodethat is arranged to be closer to the electron source than the deflection field and has an opening through which the irradiation electron beam passes; and a control electrode arranged along the optical axis to be closer to the sample than the deflection field. The sample and the objective lens are set to a reference potential. A potential lower than the reference potential is applied to the disk-shaped electrode, and a potential higher than the reference potential is applied to the control electrode.

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