The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2021

Filed:

Nov. 11, 2019
Applicants:

Koninklijke Philips N.v., Eindhoven, NL;

Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno, The Hague, NL;

Inventors:

Gereon Vogtmeier, Aachen, DE;

Dorothee Hermes, Endhoven, NL;

Bo Liu, Waalre, NL;

Andre Yaroshenko, Garching, DE;

Sandeep Unnikrishnan, Veldhoven, NL;

Johannes Wilhelmus Maria Jacobs, Bostel, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01K 1/06 (2006.01); G21K 1/06 (2006.01); G02B 5/18 (2006.01); A61B 6/00 (2006.01);
U.S. Cl.
CPC ...
G21K 1/067 (2013.01); G02B 5/1838 (2013.01); A61B 6/484 (2013.01); G21K 2201/067 (2013.01); G21K 2207/005 (2013.01);
Abstract

The invention relates to a method of manufacturing a structured grating, a corresponding structured grating component () and an imaging system. The method comprising the steps of: providing () a catalyst () on a substrate (), the catalyst () having a grating pattern; growing () nanostructures () on the catalyst () so as to form walls () and trenches () based on the grating pattern; and filling () the trenches () between the walls () of nanostructures () using an X-ray absorbing material (). The invention provides an improved method for manufacturing a structured grating and such structured grating component (), which is particularly suitable for dark-field X-ray imaging or phase-contrast imaging.


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