The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2021

Filed:

Jun. 26, 2015
Applicant:

Nec Corporation, Tokyo, JP;

Inventors:

Yukitaka Kusumura, Tokyo, JP;

Hironori Mizuguchi, Tokyo, JP;

Ryohei Fujimaki, Tokyo, JP;

Satoshi Morinaga, Tokyo, JP;

Assignee:

NEC CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06Q 30/02 (2012.01);
U.S. Cl.
CPC ...
G06Q 30/0264 (2013.01); G06Q 30/02 (2013.01); G06Q 30/0202 (2013.01); G06Q 30/0242 (2013.01);
Abstract

A prediction data input unitinputs prediction data that is one or more explanatory variables that are information likely to affect future sales. An exposure pattern generation unitgenerates an exposure pattern which is an explanatory variable indicating the content of a commercial message scheduled to be performed during a period from predicted time to future prediction target time. A component determination unitdetermines the component used for predicting the sales, on the basis of a hierarchical latent structure that is a structure in which latent variables are represented by a tree structure and components representing probability models are located at nodes of a lowest level of the tree structure, gating functions for determining a branch direction in the nodes of the hierarchical latent structure, and the prediction data and the exposure pattern. A sales prediction unitpredicts the sales on the basis of the component determined by the component determination unitand of the prediction data and the exposure pattern.


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