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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11188001 B1

PDFFull Text
Date of Patent:
Nov. 30, 2021

Filed:

Jun. 06, 2019

Alignment apparatus, alignment method, lithography apparatus, and method of manufacturing article

Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Takashi Shibayama, Utsunomiya, JP;

Takamitsu Komaki, Utsunomiya, JP;

Assignee:

CANON KABUSHIKI KAISHA, Tokyo, JP;

Attorney:

Rossi, Kimms & McDowell LLP

Primary Examiner:

Hung Nguyen

Int. Cl.
CPC ...
H01L 21/68 (2006.01); G03F 9/00 (2006.01); B29C 43/04 (2006.01); B29C 43/58 (2006.01); G01B 11/27 (2006.01); G03F 7/00 (2006.01); G01B 11/00 (2006.01); B29C 59/02 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7088 (2013.01); B29C 43/04 (2013.01); B29C 43/58 (2013.01); B29C 59/02 (2013.01); G01B 11/00 (2013.01); G01B 11/272 (2013.01); G03F 7/0002 (2013.01); G03F 9/00 (2013.01); G03F 9/7065 (2013.01); G03F 9/7076 (2013.01); H01L 21/027 (2013.01); H01L 21/68 (2013.01);
Abstract

In an alignment apparatus, a measurement device includes an illuminator that illuminates a first original-side mark and a second original-side mark arranged in an original and a first substrate-side mark and second substrate-side mark arranged in a substrate. The measurement device performs coarse measurement based on light beams from the first original-side mark and the first substrate-side mark by causing the illuminator to illuminate the first original-side mark and the first substrate-side mark under a first condition, and performs fine measurement based on light beams from the second original-side mark and the second substrate-side mark by causing the illuminator to illuminate the second original-side mark and the second substrate-side mark under a second condition.

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