The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2021

Filed:

Sep. 01, 2020
Applicant:

Metal Industries Research & Development Centre, Kaohsiung, TW;

Inventors:

Yu Kai Chen, Taichung, TW;

Chun Wei Chen, Taichung, TW;

Zhi-Wen Fan, Miaoli County, TW;

You Lun Chen, Taichung, TW;

Wen-Chieh Wu, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/16 (2006.01); C25F 7/00 (2006.01);
U.S. Cl.
CPC ...
C25F 3/16 (2013.01); C25F 7/00 (2013.01);
Abstract

An apparatus capable of local polishing and suitable for performing a plasma-electrolytic polishing process on an object is provided. The apparatus capable of local polishing includes a fixing seat, a motion mechanism, and a jet module connected to the motion mechanism and including an electrolyte communication port, a gas communication port, a power connection area, and a jet flow outlet. The jet flow outlet faces the fixing seat and is communicated with the electrolyte communication port and the gas communication port to be suitable for performing the plasma-electrolytic polishing process on the object fixed on the fixing seat. A plasma-electrolytic polishing system including an apparatus capable of local polishing is also provided.


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