The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2021
Filed:
Mar. 16, 2016
Shimadzu Corporation, Kyoto, JP;
Yokohama City University, Kanagawa, JP;
Osaka University, Osaka, JP;
Corning Incorporated, Corning, NY (US);
Tomoki Ohkubo, Kyoto, JP;
Masaki Kanai, Kyoto, JP;
Hirohisa Abe, Kyoto, JP;
Hideki Taniguchi, Kanagawa, JP;
Masahiro Kinooka, Osaka, JP;
Goro Kobayashi, Tokyo, JP;
Takanori Takebe, Kanagawa, JP;
SHIMADZU CORPORATION, Kyoto, JP;
YOKOHAMA CITY UNIVERSITY, Kanagawa, JP;
OSAKA UNIVERSITY, Osaka, JP;
CORNING INCORPORATED, Corning, NY (US);
Abstract
A cell culture container includes a storage container, a cell culture area, a culture solution supply unit, and a discharge unit. The cell culture area is a region for culturing cells, and is provided in the storage container. The culture solution supply unit supplies the culture solution into the cell culture area at a flow rate equal to or less than a predetermined flow rate. The discharge unit discharges the liquid in the cell culture area to the outside of the storage container. A rectification unit is a structure in which a plurality of outflow ports are uniformly arranged in a direction perpendicular to the flow direction of the culture solution from the culture solution supply unit to the discharge unit.