The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2021
Filed:
Jul. 09, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Michael S. Cox, Gilroy, CA (US);
Monique McIntosh, San Jose, CA (US);
Colin John Dickinson, San Jose, CA (US);
Paul E. Fisher, Los Altos, CA (US);
Yutaka Tanaka, San Jose, CA (US);
Zheng Yuan, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH, HO, H, NF, SF, F, HCl, HF, Cl, and HBr. Representative condensing abating reagents include, for example, H, HO, O, N, O, CO, CO, NH, NO, CH, and combinations thereof.