The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 23, 2021

Filed:

Oct. 27, 2019
Applicant:

Shenzhen Weitongbo Technology Co., Ltd., Shenzhen, CN;

Inventors:

Bin Lu, Shenzhen, CN;

Jian Shen, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/94 (2006.01); H01L 21/762 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/945 (2013.01); H01L 21/76232 (2013.01); H01L 29/66181 (2013.01);
Abstract

An embodiment of the present application relates to a trench capacitor and a method for manufacturing the same. The method for manufacturing the capacitor includes: fabricating a trench reaching a depth of a middle insulating layer on a semiconductor layer of an SOI substrate; and further growing an epitaxial layer of the semiconductor layer on a sidewall of the trench by selective epitaxial growth technology so as to further reduce a width of the trench; filling the trench with an electrically insulating material; and finally, fabricating two electrodes of the capacitor separately through a surface electrode. According to a trench capacitor and a method for manufacturing the same provided in an embodiment of the present application, a process flow is simple, and the capacitor manufactured has two advantages of high capacitance density and high breakdown voltage.


Find Patent Forward Citations

Loading…