The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
Sep. 06, 2018
Applicant:
Eugene Technology Co., Ltd., Yongin-Si, KR;
Inventors:
Sung Ho Kang, Hwaseong-Si, KR;
Jeong Hee Jo, Yongin-Si, KR;
Gyu Ho Choi, Yongin-Si, KR;
Hong Won Lee, Seoul, KR;
Chang Dol Kim, Yongin-Si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); C23C 16/4587 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 37/32091 (2013.01); H01J 37/32559 (2013.01); H01J 37/32834 (2013.01); H01L 21/67017 (2013.01);
Abstract
Provided is a batch-type substrate processing apparatus which supplies, into a processing space, a process gas decomposed in a separate space. The substrate processing apparatus includes: a tube; a substrate support part; a gas supply pipe; an exhaust part; and a plasma reaction part, wherein the plasma part may include a plurality of power supply electrode parts and a ground electrode part.