The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
Sep. 29, 2020
Applicant:
Mi2-factory Gmbh, Jena, DE;
Inventors:
Florian Krippendorf, Jena, DE;
Constantin Csato, Stammbach, DE;
Assignee:
MI2-FACTORY GMBH, Jena, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/05 (2006.01); H01J 37/317 (2006.01); G21K 1/10 (2006.01); G21K 1/04 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/05 (2013.01); G21K 1/043 (2013.01); G21K 1/10 (2013.01); H01J 37/1472 (2013.01); H01J 37/317 (2013.01); H01J 37/3171 (2013.01); H01J 37/3172 (2013.01); H01J 2237/002 (2013.01); H01J 2237/047 (2013.01); H01J 2237/057 (2013.01); H01J 2237/3171 (2013.01); H01J 2237/31705 (2013.01);
Abstract
The invention relates to an implantation device, an implantation system and a method. The implantation device includes a filter frame and a filter held by the filter frame, and a collimator structure. The filter is designed to be irradiated by an ion beam passing through the filter. The collimator structure is arranged on the filter, in the transmitted beam downstream of the filter, or on the target substrate.