The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
Oct. 17, 2019
Vmware, Inc., Palo Alto, CA (US);
Ashot Nshan Harutyunyan, Yerevan, AM;
Arnak Poghosyan, Yerevan, AM;
Nicholas Kushmerick, Yerevan, AM;
Naira Movses Grigoryan, Yerevan, AM;
VMware, Inc., Palo Alto, CA (US);
Abstract
Automated methods and systems to determine a baseline event-type distribution of an event source and use the baseline event type distribution to detect changes in the behavior of the event source are described. In one implementation, blocks of event messages generated by the event source are collected and an event-type distribution is computed for each of block of event messages. Candidate baseline event-type distributions are determined from the event-type distributions. The candidate baseline event-type distribution has the largest entropy of the event-type distributions. A normal discrepancy radius of the event-type distributions is computed from the baseline event-type distribution and the event-type distributions. A block of run-time event messages generated by the event source is collected. A run-time event-type distribution is computed from the block of run-time event messages. When the run-time event-type distribution is outside the normal discrepancy radius, an alert is generated indicating abnormal behavior of the event source.