The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 23, 2021

Filed:

Mar. 12, 2020
Applicant:

Brother Kogyo Kabushiki Kaisha, Nagoya, JP;

Inventors:

Yoko Yamanashi, Konan, JP;

Yukiyoshi Muto, Nagoya, JP;

Fuyuki Nakashima, Ibi-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05B 19/16 (2006.01); D05C 9/22 (2006.01); D05C 9/06 (2006.01); D05B 19/00 (2006.01); D05B 19/14 (2006.01); D05B 69/12 (2006.01); D05C 3/02 (2006.01); D05B 39/00 (2006.01);
U.S. Cl.
CPC ...
D05B 19/16 (2013.01); D05B 19/006 (2013.01); D05B 19/14 (2013.01); D05B 39/00 (2013.01); D05B 69/12 (2013.01); D05C 3/02 (2013.01); D05C 9/06 (2013.01); D05C 9/22 (2013.01);
Abstract

A sewing machine includes a sewing portion, a movement portion, a processor and a memory. The memory is configured to store computer-readable instructions that, when executed by the processor, instruct the processor to perform processes. The processes include acquiring pattern data indicating positions of a plurality of needle drop points to sew a pattern, acquiring a position of a sewing start point of the pattern, performing first correction, performing second correction that uses the acquired position of the sewing start point as a base point, and corrects the pattern data, by changing, by an acquired change amount, the positions of the plurality of needle drop points represented by the pattern data corrected by the first correction, and controlling the sewing portion and the movement portion and sewing the pattern on the sewing object, in accordance with the pattern data corrected by the second correction.


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