The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
Aug. 04, 2018
Applicant:
The Japan Steel Works, Ltd., Tokyo, JP;
Inventors:
Masamitsu Toramaru, Yokohama, JP;
Keisuke Washio, Yokohama, JP;
Masaki Chiba, Yokohama, JP;
Masao Nakata, Yokohama, JP;
Assignee:
THE JAPAN STEEL WORKS, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); C23C 16/4412 (2013.01); C23C 16/45542 (2013.01); C23C 16/45544 (2013.01); C23C 16/45591 (2013.01); C23C 16/45538 (2013.01); C23C 16/545 (2013.01);
Abstract
A plasma atomic layer deposition apparatus includes: a source gas supply port functioning also as a cleaning gas supply port provided on a first side wall of a film-forming container; and a source gas exhaust port functioning also as a cleaning gas exhaust port provided on a second side wall opposed to the first side wall of the film-forming container.