The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
Jun. 12, 2018
Dow Toray Co., Ltd., Tokyo, JP;
DOW TORAY CO., LTD., Tokyo, JP;
Abstract
A copolymer having excellent water resistance and sebum resistance while also exhibiting high washability is provided. Also provided is a composition and cosmetic material containing the copolymer. The copolymer is generally polymerized from a monomer composition comprising: (A) a carbosiloxane dendrimer monomer having a radically polymerizable organic group; and (B) an unsaturated monomer having at least one acidic group or a salt thereof per molecule; wherein monomer (A) is present in the monomer composition in an amount greater than or equal to 30 wt. % relative to the weight of the monomer composition, and a weight ratio (A/B) of monomer (A) to monomer (B) is from 1.0 to 20.0.