The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11179801 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 23, 2021

Filed:

Aug. 13, 2019
Applicant:

Fanuc Corporation, Yamanashi, JP;

Inventor:

Takashi Izumi, Yamanashi, JP;

Assignee:

Fanuc Corporation, Yamanashi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/02 (2014.01); B23K 26/03 (2006.01); B23K 26/12 (2014.01); B23K 26/14 (2014.01);
U.S. Cl.
CPC ...
B23K 26/032 (2013.01); B23K 26/12 (2013.01); B23K 26/1462 (2015.10);
Abstract

A laser processing system that can effectively blow out a material of a workpiece that is melted by a laser beam by effectively utilizing an assist gas emitted from a nozzle. The laser processing system includes a nozzle having an emission opening that emits a jet of the assist gas along an optical axis of the laser beam, the nozzle forming a maximum point of velocity of the jet at a position away from the emission opening and is configured such that during processing of the workpiece by the laser beam, a nozzle is disposed with respect to a process portion of the workpiece W, at a target position determined based on a position of the maximum point.


Find Patent Forward Citations

Izumi, Takashi. (2021). Laser processing system and laser processing method (U.S. Patent No. 11179801). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11179801

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