The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 2021

Filed:

Nov. 06, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Aakash Pushp, Santa Clara, CA (US);

Benjamin Madon, Cupertino, CA (US);

M A Mueed, San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01P 7/00 (2006.01); C23C 16/34 (2006.01); C23C 16/50 (2006.01); H01P 11/00 (2006.01);
U.S. Cl.
CPC ...
H01P 7/00 (2013.01); C23C 16/34 (2013.01); C23C 16/50 (2013.01); H01P 11/008 (2013.01);
Abstract

A titanium (Ti) seed layer is formed from a Ti source directly on a surface of a substrate, where the surface is substantially free of oxide and nitride, and a reactive nitrogen species is introduced from a nitrogen plasma source and additional Ti is introduced from the Ti source, wherein the nitrogen plasma: (a) reacts with the Ti seed layer to form TiN and (b) reacts with the additional Ti to form additional TiN. The TiN and additional TiN collectively form a TiN superconducting layer that directly contacts the surface of the substrate.


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